Photolithography is the main driving force behind the computer industry.
Sure, software, new architectures and larger harddrives etc. also play their part in pushing the envelope but it is the improvements in lithography that really marks the big steps in performance.
I wonder, if you could send a fabbing plant back in time to say, 1975, and then put some top engineers on the task of making a computer with, the then current techniques, but with the new fab, would they not arrive at a result pretty close, power wise to the current state of the art?
It seems incredible that they can keep improving the process after so many years (semiconductors have been made since the yearly 60s) and with such regularity (every 18 months double up the transistors).
Considering how all important the subject is, it seems weird that it isn’t discussed more in-depth on boards such as this.
Some of the things I would like to know more about is:
What are some of the milestones (new techniques) in photolithography over the years?
What breakthroughs has allowed the jump to 90nm and soon 65nm?
Experimental new techniques that could dramatically improve the process.
Sure, software, new architectures and larger harddrives etc. also play their part in pushing the envelope but it is the improvements in lithography that really marks the big steps in performance.
I wonder, if you could send a fabbing plant back in time to say, 1975, and then put some top engineers on the task of making a computer with, the then current techniques, but with the new fab, would they not arrive at a result pretty close, power wise to the current state of the art?
It seems incredible that they can keep improving the process after so many years (semiconductors have been made since the yearly 60s) and with such regularity (every 18 months double up the transistors).
Considering how all important the subject is, it seems weird that it isn’t discussed more in-depth on boards such as this.
Some of the things I would like to know more about is:
What are some of the milestones (new techniques) in photolithography over the years?
What breakthroughs has allowed the jump to 90nm and soon 65nm?
Experimental new techniques that could dramatically improve the process.