Kahle isn't directly speaking about CELL here, but the design and fabrication technology to be used on CELL instead. What he implies here is that the days of automatic clockspeed improvement and power consumption reduction from moving to smaller geometry is over as CMOS is running out of steam.As scaling slows, designers must pick up slack
By David Lammers
EE Times
February 2, 2004 (4:51 p.m. ET)
AUSTIN, Texas — As performance gains become harder to wring out of CMOS scaling, the chip industry increasingly will need to create more powerful design techniques to keep the chip industry on a growth path, said IBM fellow Jim Kahle during a keynote speech here at the 2004 Tau Workshop Monday (Feb. 2nd).
Kahle, who is working on the "Cell" processor design team that includes engineers from IBM Corp.'s microelectronics division, Sony Corp., and Toshiba Corp., said "CMOS is running out of steam," with interconnect delays and leakage power becoming more challenging.
"The biggest limit going forward is the human mind. How do we exploit the parallelism available to us?" Kahle said at the workshop, which focuses on timing issues. The two-day meeting, with about 75 attendees this year, is organized by the IEEE and the Association of Computer Manufacturers as the International Workshop on Timing Issues in the Specification and Synthesis of Digital Systems.
Process technology still has some tricks up its sleeve, such as silicon-on-insulator, strained silicon, multi-gate devices, and other technology advances. But overall, the 70-percent shrinks that bulk CMOS devices undergo every two or three years no longer deliver commensurate performance improvements. Metal interconnects pose a particular challenge, as copper and low-k dielectrics will not improve fast enough to keep wiring delays balanced with transistor delays, Kahle said.
To keep the chip industry healthy, companies must come up with new ways to add value that pick up the slack in bulk CMOS scaling. Design tools must be developed that are able to handle variability stemming from multiple cores, multiple threshold voltages, more complex clock distribution and wire delay models, as well as shifts in temperature and droops in the supply voltage.
IBM is working the challenge presented by these variables, which become more impactful as devices shrink. Chandu Visweswariah, a member of the technical staff at IBM's T.J. Watson Research Center, and Kerim Kalafala, an EDA engineer at IBM Microelectronics, presented work on "EinsStat," a tool under development that will work with IBM's timing analysis tool "EinsTimer."
EinsStat uses statistical techniques, rather than the traditional corner-based static timing methodology, to measure on-chip variabilities. While statistical analysis has been under study for many years, previous attempts have resulted in overly-long simulation times. IBM was able to test variables on a 2.1-million gate Asic design in one hour and 10 minutes, plus setup time. A 3,000 gate design required only 18 minutes of CPU time, said Visweswariah.
Kalafala said the project requires cooperation among process, EDA, and circuit modeling enginers, which must create a design methodology that makes sense to circuit and chip designers.
"This kind of project is not an area where you can snap your fingers and make it happen. It requires a lot of different groups to work together, which is something that IBM can do because we have all of these different kinds of expertise under one roof," he said.
Last week, IBM announced that it would merge its microelectronics and server divisions. Visweswariah said the "EinsStat" tool will prove useful initially in developing microprocessors used by the IBM server division. He declined to speculate when EinsStat would come into use within IBM.
CELL@65 nm won't particularly be better than 90 nm devices on both clockspeed and power consumption, only smaller. So the forthcoming 90 nm devices will give us a good idea of CELL@65 nm's clockspeed and power consumption level.
Edit. I changed the title because Kahle is the chief architect of CELL, so what he is saying right now about sub 90 nm fab technology has direct implications for CELL....