hitechjb1
09-14-03, 02:38 AM
I do not know what wafer integrity refers to. There are process variations of a given silicon manufacturing process, as any manufacturing process. As a result, the intrsinic silicon proporties, such as transistor channel length and width, gate oxide thickness, silicon carrier doping, transistor threshold voltage, leakage current, ..., of a wafer vary to certain extent (sigma variation). As further scaling down, statistical variation comes into play, namely, nearby transistors in the same chip/wafer can behave differently.
A more interesting question is what the implications of these wafer properties of lower threshold voltage and shorter channel length due to process variation of a manufacturing process are, as I suspect for the the Tbred B DLT3C. It is being rated at lower Vcore but it can run faster than other Tbred B at same voltage. Even it is manufactured with 0.13 micron like other Tbred B, it is effectively behaving like a chip with less than 0.13 micron, resembling the future generation trend.
As the transistor size (channel length) of future generations of silicon chips are scaled down to, e.g., 90, 65, 45, ... nano-meter, the supply voltage, transistor channel length and threshold voltage will be lowered accordingly. Even the supply voltage is lower, the transistors run faster, both current and power density also increase (actual trend). As the transistors are scaled down, logic gate delay decreases, both the active power density (W/cm^2) and the passive leakage power density (both gate and subthreshold) increase. The passive component increases at an even faster pace.
For more details about the low voltage Tbred B 1700+, refer to
Why the 1700+ can run so fast at low Vcore? (
http://forum.oc-forums.com/vb/showthread.php?s=&postid=1734079#post1734079)
Originally posted by hitechjb1
Why the 1700+ can run so fast at low Vcore?
The Tbred B 1700+ DLT3C is based on the same 0.13 micron bulk silicon process as all the other model 8 (Tbred A and Tbred B) from XP 1600+ to 2800+ (recently 3000+). (BTW, Tbred B has one more metal layer than Tbred A, both are 0.13u.)
The hammers (Opteron, Athlon 64) are based on 0.13 mircro SOI process, will go to 0.09 mircro eventually.
The Tbred B 1700/1800+ have the same transistor count, same L1, L2 cache size, same number of metal layers, same chip dimensions, ... as the 1.6 and 1.65 V rated Tbred B.
Side track: Same for Barton, which is also based on the 0.13 micron process. But it is a different chip, different transistor counts, chip dimension and has bigger L2 cache of 512KB instead of 256KB in Tbred.
I think the reason why the Tbred B 1700+ DLT3C can work at rated 1.5V and can be clocked at simliar highest clock frequency (if not better) as all the other 1.6V and 1.65V rated Tbred B is due to the following:
Its transistors have lower threshold characteristics due to process variation which produces transistors with shorter channel length. Shorter channel means lower transistor threshold, runs faster, draws larger leakage current and higher active current (hence higher active power). According to AMD spec, the 1.5V 1700+ has higher rated current than the 1.6V 1700+ (about 7% more).
Threshold voltage of a transistor is the gate voltage above which the transistor will conduct current orders of magnitude higher from source to drain compared to that below the threshold. Chips with lower threshold transistors can perform equally well with a lower supply voltage (Vcore) as those with higher threshold, because the transistors can conduct at a lower gate voltage.
This is normal for a given silicon process (say 0.13u) to have such variation that some transistors in certain chip die have shorter channel length (less than 0.13u) or some have longer channel length. Those that have shorter channel length have faster intrinsic speed and can run as fast when smaller Vcore is applied (pros). On the other hand (cons), due to the lower threshold voltage which draws higher leakage current and generates more heat at the same higher Vcore, these chips can run as fast at a low Vcore as the higher Vcore rate chips, but they will max out at a lower Vcore compared to the higher Vcore rated siblings.
The 1700+ has a run-away current at a lower Vcore compared to the 2100+. Run-away current refers to the leakage current and the heat generated positively feeding each other resulting instability.
The final oc success of the Tbred B 1700+/1800+ DLT3C is a race between its natural, born, intrinsic characteristics, the balance and tradeoff between the smaller channel length, lower transistor threshold, hence faster, and the opposing, negative behaviour of higher leakage current, and heat generated.