Panajev2001a
Veteran
Sony, Toshiba to develop next-generation chip
Reuters, 02.12.04, 3:34 AM ET
TOKYO, Feb 12 (Reuters) - Sony Corp <6758.T> and Toshiba Corp <6502.T> said on Thursday they plan to each invest 10 billion yen ($95 million) to jointly develop a microchip that will be smaller and more powerful than any now available.
The planned next-generation semiconductor will have 45-nanometre circuitry -- even narrower than the circuitry planned for "cell", a 65-nanometre microprocessor being developed by the two companies and IBM Corp (nyse: IBM - news - people).
"Cell" is expected to power Sony's next-generation game console.
A nanometre is one-billionth of a metre.
"We started working with Sony on developing a 65-nanometre system LSI in May 2001 and that project will finish up in March. We consider this an extension of that joint project," said Toshiba spokesman Junichi Nagaki.
Toshiba and Sony target completion of a 45-nanometre system LSI (large-scale integrated) -- a high-end microchip that combines multiple functions on one piece of silicon to power everything from DVD recorders to game machines -- by late 2005.
Sony has invested more than 300 billion yen since 1999 to develop and shrink the chips to power the PlayStation 2 (PS2) by almost 80 percent. By creating a smaller chip, Sony can produce more per 200-millimetre (eight-inch) wafer and reduce costs.
Initially, Sony used 180-nanometre processing technology to manufacture the PS2 chips, but it has gradually moved to narrower circuitry in recent years. Sony started manufacturing chips with 90-nanometre circuitry last year.
Sony plans to invest 500 billion yen over the next three years in semiconductors, including 200 billion yen for "cell", which will initially use 300 millimetre wafers and 65-nanometre circuitry.
Toshiba's semiconductor business is the crown jewel of the sprawling conglomerate.
The company forecasts an operating profit of 110 billion yen from its chip operations in the business year to March 31 versus an estimated 140 billion yen for its consolidated results.
The partnership with Sony allows Toshiba to diffuse some of the heavy development costs needed to upgrade its chip technology.
Prior to the announcement, Sony shares closed up 0.93 percent at 4,350 yen and Toshiba shares finished up 2.36 percent at 434 yen. The Nikkei 225 average <.N225> rose 0.91 percent. ($1=105.35 yen)
Copyright 2004, Reuters News Service
http://www.forbes.com/home_asia/newswire/2004/02/12/rtr1257832.html
Let me post somethign about the 45 nm manufacturing process they are working on ( and how it can save money for chips like the GS 3/Visualizer which are e-DRAM heavvy, but even the EE 3/Broadband Engine should contain e-DRAM ).
Toshiba Develops the World's First Embedded DRAM Memory Cell Technology on Silicon-on-Insulator Wafer
13 June, 2003
TOKYO -- Toshiba Corporation today announced that Toshiba has developed and verified the operability of the world's first memory cell technology for embedded DRAM system LSIs on silicon-on-insulator (SOI) wafers. Toshiba aims to apply the new technology to mass production of system LSIs for broadband network applications in 2006.
The move to ubiquitous computing -- total connectivity at all times -- relies on high-performance equipment. This in turn requires advanced system LSIs integrating ultra-high performance transistors and embedded high-density memory. One promising measure to dramatically raise transistor processing speed is fabrication of system LSI on a new-generation silicon substrate, silicon-on-insulator (SOI). However, the conventional DRAM cell structure is designed for conventional bulk wafers and it is difficult to produce embedded DRAM on SOI wafer.
Toshiba has experimentally fabricated a 96kbit cell array and verified the practical operability of the advanced cell structure with sufficient characteristics required for embedded DRAM system LSIs on SOI.
Full details of the new technology were presented on June 11 and 12 at the VLSI Symposium in Kyoto, Japan.
What is SOI?
Unlike a conventional bulk wafer, the SOI wafer comprises three layers: one single-crystal layer of silicon; a base silicon substrate; and a thin insulator, 1/1,000 the thickness of a human hair, that electrically insulates the single-crystal layer from the substrate, inhibiting waste electronic leakage to the substrate. The result is lower power consumption and higher processing speeds.
Toshiba succeeded in forming embedded DRAM system LSI on an SOI wafer by developing a new DRAM memory cell technology that makes use of the characteristics of SOI wafer itself, eliminating the necessity of capacitors where current DRAM cell stores data. The new memory cell technology, dubbed floating body cell (FBC), will be used for embedded DRAM system LSI for the 45-nanometer generation on.
Principle of Operation and cell structure
Conventional DRAM cell consists of a capacitor, where electric charge is stored, and a transistor that function as switches. The newly developed FBC does not have a capacitor and memorizes data by storing the electric charge in its transistor. Since the transistor works as both capacitor and electric switch, the cell area is half that of a conventional DRAM cell.
Manufacturing process
Compatibility in the manufacturing processes of DRAM cells and logic ICs is a crucial issue for the development of embedded DRAM cell technology for SOI-based system LSI. Toshiba's new process achieves full compatibility without any degradation in the performance of systems LSI. In order to ensure compatibility, poly-Si plug, a buffer layer of poly-silicon, is formed in contact area in memory cell.
Verified Operability
Toshiba's experimental 96Kbit cell array achieved successful operation in all bits, a 36-nanosecond access time, 30-nanosecond data switching time, and 500-millisecond data retention time (at 85 degrees C). The results demonstrate that the new FBC technology can be applied to system LSI integrating DRAM cells with megabit or greater memory capacity.
Note:
1 nanometer = one billionth of a meter
As you cna see the area needed by the e-DRAM memory cell is greatly reduced and this means saving quite a bit of money for high volume chips that make at least decent use of e-DRAM in their designs.
This should be the basis for CMOS6 ( the 45 nm manufacturing process co-developed by Sony and Toshiba ) and for the next-generation e-DRAM manufacturing process for the two companies.
Toshiba is the current partner of Sony for what concerns e-DRAM development.
Until the 130 nm generation they used e-DRAM co-designed with Fujitsu, but then they moved onto a new e-DRAM design ( more efficient, suing trench capacitor structure instead of the older stacked capacitor streucture which caused higher heat and reduced the maximum switchign speed of the logic transistors ) co-designed with Toshiba.
http://www.toshiba.co.jp/about/press/2003_06/pr1301.htm
The new 45 nm announcement in Toshiba's own words:
http://www.toshiba.co.jp/about/press/2004_02/pr1201.htm