Foundry production questions.
1. Once a chip is in production, what can be done to improve yields? Note, I am asking this based on the assumption that there is no change in masks.
2. On any given process how consistent are things like gate length? For example if a design called for .65nm what margin would be realistic. Looking at this picture
could this be a cherry picked transistor or would it be reasonable to say that the gate length would vary from .5nm to .4nm or not at all?
3.How long do masks last?
4. Looking at this quote...
5. When or will the half step disappear?
1. Once a chip is in production, what can be done to improve yields? Note, I am asking this based on the assumption that there is no change in masks.
2. On any given process how consistent are things like gate length? For example if a design called for .65nm what margin would be realistic. Looking at this picture
3.How long do masks last?
4. Looking at this quote...
How do you get a reduction in size if you only reduce the metal layers? Please excuse this question if it is overly ignorant.ascinewbie said:TSMC and UMC's 0.15u/0.11u lines were envisioned, developed, and marketed as 'cost-reduced' production lines. To achieve this goal, they limit the level of miniaturization to the metal-layers only, allowing the half-node processes to re-use the foundry's investment in already existing/deployed processing-equipment. I'm sure "true" half-node (0.15u, 0.11u) production lines exist elsewhere in the semiconductor industry (like the dedicated DRAM foundries.)
5. When or will the half step disappear?