Saw this on [H]:
LINK
Very nice for ATi from an eng point of view!
MuFu.
According to Dick James, Chipworks' senior technology analyst, "Chipworks has been trying to obtain true low-k parts for over a year, but each time we analyzed a leading edge chip, we found FSG in there. This is the first chip that Chipworks has seen with significant structural changes that indicate the use of a 'true low-k' dielectric. By 'true low-k', we mean a layer with a dielectric constant of 3.0 or lower."
Preliminary analysis shows that the part is manufactured in a 130nm process, with eight levels of copper. The low-k material is used to isolate the lower six levels, and FSG for the top two metal layers. Also, the dual damascene structure is different from the FSG process. There is no etch-stop layer and the vias have a multi-stepped structure. Chipworks is continuing the analysis to fully characterize the leading edge processing of this device.
"Chipworks is always looking for the latest and greatest semiconductor technology, either through our international network of suppliers or by purchasing strategic downstream consumer products. Being the first identified true low k device, the ATI RADEON 9600 XT project will provide engineers the opportunity to look inside this latest technology node." stated Chipworks president, Julia Elvidge.
LINK
Very nice for ATi from an eng point of view!
MuFu.